Investigation of product design weaknesses using model-based OPC sensitivity analysis

Investigation of product design weaknesses using model-based OPC sensitivity analysis

著者名:

Postnikov, S.V. ( Motorola, Inc. (USA) )

Lucas, K. ( Motorola, Inc. (USA) )

Garza, C.M. ( Motorola, Inc. (USA) )

Wimmer, K. ( Motorola, Inc. (France) )

LaCour, P. ( Mentor Graphics Corp. (USA) )

Word, J.C. ( Integrated Device Technology, Inc. (USA) )

さらに 1 件

掲載資料名:

Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5042

発行年:

2003

開始ページ:

160

終了ページ:

171

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448477 [0819448478]

言語:

英語

請求記号:

P63600/5042

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013033
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Design and process integration for microelectronic manufacturing
回次:	2003 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.26-2003.02.28

類似資料:

1 国際会議録 Impact of optimized illumination upon simple lambda-based design rules for low-K1 lithography Postnikov,S.V., Lucas,K., Wimmer,K. SPIE-The International Society for Optical Engineering	7 国際会議録 Model-based OPC for first-generation 193-nm lithography Lucas,K.D., Word,J.C., Vandenberghe,G.N., Verhaegen,S., Jonckheere,R.M. SPIE-The International Society for Optical Engineering
2 国際会議録 Model-based design improvements for the 100-nm lithography generation Lucas, K., Postnikov, S.V., Patterson, K., Yuan, C.-M., Thomas, C., Thompson, M.A., Carter, R., Litt, L.C., Montgomery, … SPIE-The International Society for Optical Engineering	8 国際会議録 Investigation of model-based physical design restrictions(Invited Paper) Lucas, K., Baron, S., Belledent, J., Boone, R., Borjon, A., Couderc, C., Patterson, K., Riviere-Cazaux, L., Rody, Y., … SPIE - The International Society of Optical Engineering
3 国際会議録 Re-evaluating simple lambda-based design rules for low-K1 lithography process control Postnikov,S.V., Lucas,K.D., Roman,B.J., Wimmer,K. SPIE - The International Society for Optical Engineering	9 国際会議録 Lithographic process window analysis by statistical means Bourov, A., Postnikov, S.V., Lucas, K. SPIE-The International Society for Optical Engineering
4 国際会議録 Monte Carlo method for highly efficient and accurate statistical lithography simulations Postnikov, S.V., Lucas, K., Wimmer, K., Ivin, V., Rogov, A. SPIE-The International Society for Optical Engineering	10 国際会議録 Combining OPC and design for printability into 65-nm logic designs Lucas, K.D., Yuan, C.-M., Boone, R., Strozewski, K., Porter, J., Tian, R., Wimmer, K., Cobb, J., Wilkinson, B., Toublan, … SPIE - The International Society of Optical Engineering
5 国際会議録 Process, design, and optical proximity correction requirements for the 65-nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering	11 テクニカルペーパー 1-D Dynamic Modeling and Sensitivity Analysis in Product Design. Michelotti, A.C., da Silva, J.C. Society of Automotive Engineers
6 国際会議録 Process, design and optical proximity correction requirements for the 65nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering	12 国際会議録 Considerations for the use of defocus models for OPC Sturtevant, J. L., Torres, J. A., Word, J., Granik, Y., LaCour, P. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12