Dense only phase-shift template lithography

Dense only phase-shift template lithography

著者名:

Fritze, M. ( MIT Lincoln Lab. (USA) )

Tyrrell, B. ( MIT Lincoln Lab. (USA) )

Mallen, R.D. ( MIT Lincoln Lab. (USA) )

Wheeler, B. ( MIT Lincoln Lab. (USA) )

Rhyins, P.D. ( Photronics, Inc. (USA) )

Martin, P.M. ( Photronics, Inc. (USA) )

さらに 1 件

掲載資料名:

Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5042

発行年:

2003

開始ページ:

15

終了ページ:

29

総ページ数:

15

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448477 [0819448478]

言語:

英語

請求記号:

P63600/5042

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013033
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Design and process integration for microelectronic manufacturing
回次:	2003 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.26-2003.02.28

類似資料:

1 国際会議録 Investigation of the physical and practical limits of dense-only phase-shift lithography for circuit feature definition Tyrrell, B., Fritze, M., Mallen, R.D., Wheeler, B., Rhyins, P.D., Martin, P.M. SPIE-The International Society for Optical Engineering	7 国際会議録 Minimizing mask complexity for advanced optical lithography Fritze, M., Tyrrell, B. SPIE - The International Society of Optical Engineering
2 国際会議録 Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography Fritze,M., Tyrrell,B., Astolfi,D.K., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Chan,D.Y., Rhyins,P.D., … SPIE-The International Society for Optical Engineering	8 国際会議録 Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node Rhyins,P., Fritze,M., Chan,D., Carney,C., Blachowicz,B.A., Vieira,M., Mack,C.A. SPIE-The International Society for Optical Engineering
3 国際会議録 Minimization of image placement errors in chromeless phase-shift mask lithography Fritze, M., Tyrrell, B., Cann, S.G., Carney, C., Blachowicz, B.A., Brzozowy, D., Kocab, T., Bowdoin, S., Rhyins, P.D., … SPIE-The International Society for Optical Engineering	9 国際会議録 150-nm dense/isolated contact hole study with Canon IDEAL technique Ebihara,T., Rhyins,P., Oga,T., Martin,P.M., Sweis,M. SPIE-The International Society for Optical Engineering
4 国際会議録 Fabrication of Step and Flash imprint lithography templates using commercial mask processes Thompson, E., Rhyins, P.D., Voisin, R.D., Sreenivasan, S.V., Martin, P.M. SPIE-The International Society for Optical Engineering	10 国際会議録 The improvement of the overlay accuracy using the reticle distortion correction for EPL technologies Fritze, M., Tyrrell, B., Fedynyshyn, T., Rothschild, M., Brooker, P. SPIE - The International Society of Optical Engineering
5 国際会議録 Limits of strong phase-shift patterning for device research Fritze, M., Mallen, R.D., Wheeler, B., Yost, D., Snyder, J.P., Kasprowicz, B.S., Eynon, B.G., Liu, H.-Y. SPIE-The International Society for Optical Engineering	11 国際会議録 Integration of high-speed surface-channel charge coupled devices into an SOI CMOS process using strong phase shift lithography J. Knecht, V. Bolkhovsky, J. Sage, B. Tyrrell, B. Wheeler Society of Photo-optical Instrumentation Engineers
6 国際会議録 100-nm node lithography with KrF? Ferri,J.E., Tyrrell,B., Astolfi,D.K., Yost,D., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Liu,H.Y., … SPIE-The International Society for Optical Engineering	12 国際会議録 Process monitoring of etched fused silica phase-shift reticles Brooks, C.B., Buie, M.J., Waheed, N.L., Martin, P.M., Walsh, P., Evans, G. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12