Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era
- 著者名:
You, T.-J. ( Hynix Semiconductor Inc. (South Korea) ) Kim, H.S. ( Hynix Semiconductor Inc. (South Korea) ) Kim, J.-S. ( Hynix Semiconductor Inc. (South Korea) ) Kim, S.-K. ( Hynix Semiconductor Inc. (South Korea) ) Kim, Y.-D. ( Hynix Semiconductor Inc. (South Korea) ) Youn, H.S. ( Hynix Semiconductor Inc. (South Korea) ) Kong, K.-K. ( Hynix Semiconductor Inc. (South Korea) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part Three
- 開始ページ:
- 1327
- 終了ページ:
- 1334
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
国際会議録
Successful application of angular scatterometry to process control in sub-100-nm DRAM device
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |