Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM

Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM

著者名:

Eom, T.-S. ( Hynix Semiconductor Inc. (South Korea) )

Lim, C.-M. ( Hynix Semiconductor Inc. (South Korea) )

Kim, S.-M. ( Hynix Semiconductor Inc. (South Korea) )

Kim, H.-B. ( Hynix Semiconductor Inc. (South Korea) )

Oh, S.-Y. ( Hynix Semiconductor Inc. (South Korea) )

Ma, W.-K. ( Hynix Semiconductor Inc. (South Korea) )

Moon, S.-C. ( Hynix Semiconductor Inc. (South Korea) )

Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )

さらに 3 件

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part Three

開始ページ:

1310

終了ページ:

1320

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013031
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

類似資料:

1 国際会議録 Feasibility studies of ArF chromeless mask (CLM) for sub-80-nm era Eom, T.-S., Lim, C.-M., Sung, M.G., Moon, S.-C., Shin, K.S. SPIE - The International Society of Optical Engineering	7 国際会議録 Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world Kim, I.-S., Jung, S.-G., Kim, H.-D., Yeo, G.-S., Shin, I.-K., Lee, J.-H., Cho, H.-K., Moon, J.-T. SPIE-The International Society for Optical Engineering
2 国際会議録 TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering	8 国際会議録 Optimum biasing for 45 nm node chromeless and attenuated phase shift mask Y.-M. Kang, H.-K. Oh Society of Photo-optical Instrumentation Engineers
3 国際会議録 0.33-k1 ArF lithography for 100-nm DRAM Bok, C.K., Kim, S.-K., Kim, H.-B., Oh, J.-S., Ahn, C.-N., Shin, K.-S. SPIE-The International Society for Optical Engineering	9 国際会議録 Diffraction analysis of customized illumination technique Lim, C.-M., Kim, S.-M., Eom, T.-S., Moon, S.-C., Shin, K.S. SPIE - The International Society of Optical Engineering
4 国際会議録 Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography Koo,S.-S., Kim,S.-J., Paek,S.-W., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering	10 国際会議録 Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography Ham,Y.-M., Kim,S.-M., Kim,S.-J., Bae,S.-M., Kim,Y.-D., Baik,K.-H. SPIE-The International Society for Optical Engineering
5 国際会議録 Double exposure to reduce overall line-width variation of 80-nm DRAM gate Ma, W.-K., Lim, C.-M., Oh, S.-Y., Nam, B.-H., Moon, S.-C., Shin, K.S. SPIE - The International Society of Optical Engineering	11 国際会議録 Comparison study on mask error factor in 100-nm ArF and KrF lithography Eom,T.-S., Hyun,Y.-S., Kim,C.-K., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering
6 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	12 国際会議録 Attenuated phase-shifting mask in ArF lithography Miyazaki, J., Uematsu, M., Nakazawa, K., Matsuo, T., Onodera, T., Ogawa, T. SPIE - The International Society of Optical Engineering

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