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Mighty high-T lithography for 65-nm generation contacts

著者名:
Conley, W. ( Motorola, Inc. (USA) )
Montgomery, P.K. ( IMEC (Belgium) )
Lucas, K. ( Motorola, Inc. (USA) )
Litt, L.C. ( Motorola, Inc. (USA) )
Maltabes, J.G. ( Motorola, Inc. (USA) )
Dieu, L. ( DuPont Photomasks, Inc. (USA) )
Hughes, G.P. ( DuPont Photomasks, Inc. (USA) )
Mellenthin, D.L. ( DuPont Photomasks, Inc. (USA) )
Socha, R.J. ( ASML (USA) )
Fanucchi, E.L. ( Motorola, Inc. (USA) )
Verhappen, A. ( ASML (Netherlands) )
Wampler, K.E. ( ASML (USA) )
Yu, L. ( ASML (USA) )
Schaefer, E. ( ASML (USA) )
Cassel, S. ( ASML (USA) )
Kuijten, J.P. ( ASML (Netherlands) )
Pijnenburg, W. ( ASML (Netherlands) )
Wiaux, V. ( IMEC (Belgium) )
Vandenberghe, G. ( IMEC (Belgium) )
さらに 14 件
掲載資料名:
Optical Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5040
発行年:
2003
巻:
Part Two
開始ページ:
1210
終了ページ:
1219
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
言語:
英語
請求記号:
P63600/5040
資料種別:
国際会議録

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