Mighty high-T lithography for 65-nm generation contacts
- 著者名:
Conley, W. ( Motorola, Inc. (USA) ) Montgomery, P.K. ( IMEC (Belgium) ) Lucas, K. ( Motorola, Inc. (USA) ) Litt, L.C. ( Motorola, Inc. (USA) ) Maltabes, J.G. ( Motorola, Inc. (USA) ) Dieu, L. ( DuPont Photomasks, Inc. (USA) ) Hughes, G.P. ( DuPont Photomasks, Inc. (USA) ) Mellenthin, D.L. ( DuPont Photomasks, Inc. (USA) ) Socha, R.J. ( ASML (USA) ) Fanucchi, E.L. ( Motorola, Inc. (USA) ) Verhappen, A. ( ASML (Netherlands) ) Wampler, K.E. ( ASML (USA) ) Yu, L. ( ASML (USA) ) Schaefer, E. ( ASML (USA) ) Cassel, S. ( ASML (USA) ) Kuijten, J.P. ( ASML (Netherlands) ) Pijnenburg, W. ( ASML (Netherlands) ) Wiaux, V. ( IMEC (Belgium) ) Vandenberghe, G. ( IMEC (Belgium) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part Two
- 開始ページ:
- 1210
- 終了ページ:
- 1219
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
国際会議録
Process, design, and optical proximity correction requirements for the 65-nm device generation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
国際会議録
Process, design and optical proximity correction requirements for the 65nm device generation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
SPIE-The International Society for Optical Engineering |