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Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF

著者名:
  • Kang, M.-A. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Shin, I.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
掲載資料名:
Optical Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5040
発行年:
2003
巻:
Part Two
開始ページ:
1115
終了ページ:
1124
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
言語:
英語
請求記号:
P63600/5040
資料種別:
国際会議録

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