Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF

Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF

著者名:

Kang, M.-A. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Shin, I.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part Two

開始ページ:

1115

終了ページ:

1124

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013030
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

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1 国際会議録 Effect of mask reduction ratio in alternating phase-shift masks Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K. SPIE-The International Society for Optical Engineering	7 国際会議録 Sub-120-nm technology compatibility of attenuated phase-shift mask in KrF and ArF lithography Ham,Y.-M., Kim,S.-M., Kim,S.-J., Bae,S.-M., Kim,Y.-D., Baik,K.-H. SPIE-The International Society for Optical Engineering
2 国際会議録 Doubly exposed patterning characteristics using two alternating phase-shift masks Lee,S.-W., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Yoon,H.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	8 国際会議録 Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes Lim,S.-C., Kye,J.-W., Woo,S.-G., Kim,S.-G., Kang,H.-Y., Han,W.-S., Koh,Y.-B. SPIE-The International Society for Optical Engineering
3 国際会議録 Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks Lee,S.-W., Chung,D.-H., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	9 国際会議録 Feasibility study on the ArF attenuated phase-shift mask for 100-nm node lithography Koo,S.-S., Kim,S.-J., Paek,S.-W., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering
4 国際会議録 Evaluation of various alternating phase shifting mask processes for KrF lithography Yoon,S.-Y., Cha,H.-S., Choi,S.-J., Jung,S.-M., Choi,S.-S., Jeong,S.-H. SPIE-The International Society for Optical Engineering	10 国際会議録 Application of Cr-less mask technology for sub-100-nm gate with single exposure Kim, S.-H., Chung, D.-H., Park, J.S.., Shin, I.K., Choi, S.W., Sohn, J.-M., Lee, J.-H., Shin, H.-S., Chen, J.F., Van Den … SPIE-The International Society for Optical Engineering
5 国際会議録 Analytical approach to X-phenomenon in alternating phase-shifting masks Park, J.R., Kim, S.-H., Lee, H.-J., Jang, I.-Y., Choi, Y.-H., Yang, S.-H., Lee, Y.-H., Kim, Y.-H., Choi, S.-W., Yoon, … SPIE-The International Society for Optical Engineering	11 国際会議録 Phase-defocus windows for alternating phase-shifting mask Liang, F. -J., Chen, C. -K., Shin, J. -J., You, J. -W., Lin, C. -H., Pan, Z. -Y., Shu, K. -C., Gau, T. -S., Lin, B. J. SPIE - The International Society of Optical Engineering
6 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	12 国際会議録 Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask Petersen,J.S., Williams,A.M., Rich,G.K., Miller,D.A., Martinez,A.M.,Jr. SPIE-The International Society for Optical Engineering

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