Extending ArF to the 65-nm node with full-phase lithography
- 著者名:
Driessen, F.A. ( Numerical Technologies, Inc. (USA) ) Pierrat, C. ( Numerical Technologies, Inc. (USA) ) Vandenberghe, G. ( IMEC (Belgium) ) Ronse, K.G. ( IMEC (Belgium) ) Adrichem, P. ( Numerical Technologies, Inc. (USA) ) Liu, H.-Y. ( Numerical Technologies, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part Two
- 開始ページ:
- 1091
- 終了ページ:
- 1102
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |