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Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating

著者名:
Liu, W. ( Applied Materials, Inc. (USA) )
Mui, D. ( Applied Materials, Inc. (USA) )
Lill, T. ( Applied Materials, Inc. (USA) )
Wang, M.D. ( Applied Materials, Inc. (USA) )
Bencher, C. ( Applied Materials, Inc. (USA) )
Kwan, M. ( Applied Materials, Inc. (USA) )
Yeh, W. ( Applied Materials, Inc. (USA) )
Ebihara, T. ( Canon Inc. (USA) )
Oga, T. ( Canon Inc. (USA) )
さらに 4 件
掲載資料名:
Optical Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5040
発行年:
2003
巻:
Part Two
開始ページ:
841
終了ページ:
848
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
言語:
英語
請求記号:
P63600/5040
資料種別:
国際会議録

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