Status 157-nm lithography development at IMEC
- 著者名:
Ronse, K.G. ( IMEC (Belgium) ) Bisschop, P.D. ( IMEC (Belgium) ) Eliat, A. ( IMEC (Belgium) ) Goethals, A.M. ( IMEC (Belgium) ) Hermans, J. ( IMEC (Belgium) ) Jonckheere, R. ( IMEC (Belgium) ) Heuvel, D.V.D. ( IMEC (Belgium) ) Roey, F.V. ( IMEC (Belgium) ) Beckx, S. ( IMEC (Belgium) ) Wouters, J.M. ( IMEC (Belgium) ) Marneffe, J.F. ( IMEC (Belgium) ) O'Neil, T. ( ASML (USA) ) Tirri, B. ( ASML (USA) ) Sewell, H. ( ASML (USA) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 640
- 終了ページ:
- 649
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
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