Image performance and mask characterization of 157-nm alternating phase-shifting mask
- 著者名:
Chen, Y.-T. ( International SEMATECH (USA) ) Meute, J. ( International SEMATECH (USA) ) Dean, K.R. ( International SEMATECH (USA) ) Stark, D.R. ( International SEMATECH (USA) ) Schilz, C.M. ( Infineon Technologies AG (Germany) ) Dettmann, W. ( Infineon Technologies AG (Germany) ) Koehle, R. ( Infineon Technologies AG (Germany) ) Schiessl, B. ( Infineon Technologies AG (Germany) ) Degel, W. ( Carl Zeiss Microelectronic Systems GmbH (Germany) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 618
- 終了ページ:
- 628
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |