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Image performance and mask characterization of 157-nm alternating phase-shifting mask

著者名:
Chen, Y.-T. ( International SEMATECH (USA) )
Meute, J. ( International SEMATECH (USA) )
Dean, K.R. ( International SEMATECH (USA) )
Stark, D.R. ( International SEMATECH (USA) )
Schilz, C.M. ( Infineon Technologies AG (Germany) )
Dettmann, W. ( Infineon Technologies AG (Germany) )
Koehle, R. ( Infineon Technologies AG (Germany) )
Schiessl, B. ( Infineon Technologies AG (Germany) )
Degel, W. ( Carl Zeiss Microelectronic Systems GmbH (Germany) )
さらに 4 件
掲載資料名:
Optical Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5040
発行年:
2003
巻:
Part One
開始ページ:
618
終了ページ:
628
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
言語:
英語
請求記号:
P63600/5040
資料種別:
国際会議録

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