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Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask

著者名:
Park, J.R. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, S.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yeo, G.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Ki, W.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, H.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 2 件
掲載資料名:
Optical Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5040
発行年:
2003
巻:
Part One
開始ページ:
553
終了ページ:
560
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
言語:
英語
請求記号:
P63600/5040
資料種別:
国際会議録

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