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Precision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-μm CMOS technology

著者名:
Lee, T.-K. ( Taiwan Semiconductor Manufacturing Co.,Ltd. (Taiwan) )
Wang, Y.-C.
Chi, M.-H.
Lu, C.Y.
Hsieh, C.H.
Liu, R.G.
Liao, H.J.
Yang, S.S.
Chang, C.-H.
さらに 4 件
掲載資料名:
Optical Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5040
発行年:
2003
巻:
Part One
開始ページ:
450
終了ページ:
456
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
言語:
英語
請求記号:
P63600/5040
資料種別:
国際会議録

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