Pecision control of poly-gate CD by local OPC for elimination of microloading effect on 0.13-Цm CMOS technology
- 著者名:
Lee, T.-K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Wang, Y.-C. Chi, M.-H. Lu, C.Y. Hsieh, C.H. Liu, R.G. Liao, H.J. Yang, S.S. Chang, C.-H. - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 450
- 終了ページ:
- 456
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
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0.13-ヲフm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks
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