Process, design and optical proximity correction requirements for the 65nm device generation
- 著者名:
Lucas, K. ( Motorola, Inc. (USA) ) Montgomery, P. ( Motorola, Inc. (USA) ) Litt, L.C. ( Motorola, Inc. (USA) ) Conley, W. ( Motorola, Inc. (USA) ) Postnikov, S.V. ( Motorola, Inc. (USA) ) Wu, W. ( Motorola, Inc. (USA) ) Yuan, C.-M. ( Motorola, Inc. (USA) ) Olivares, M. ( Motorola, Inc. (USA) ) Strozewski, K. ( Motorola, Inc. (USA) ) Carter, R.L. ( Motorola, Inc. (USA) ) Vasek, J. ( Motorola, Inc. (USA) ) Smith, D. ( Motorola, Inc. (USA) ) Fanucchi, E.L. ( Motorola, Inc. (USA) ) Wiaux, V. ( IMEC (Belgium) ) Vandenberghe, G. ( IMEC (Belgium) ) Toublan, O. ( Mentor Graphics Corp. (France) ) Verhappen, A. ( ASML (Netherlands) ) Kuijten, J.P. ( ASML (Netherlands) ) Wingerden, J. ( Philips Research Labs. (Belgium) ) Kasprowicz, B.S. ( Photronics, Inc. (USA) ) Tracy, J.W. ( Photronics, Inc. (USA) ) Progler, C.J. ( Photronics, Inc. (USA) ) Shiro, E. ( Motorola, Inc. (Russia) ) Topouzov, I. ( Motorola, Inc. (Russia) ) Wimmer, K. ( Motorola, Inc. (France) ) Roman, B.J. ( Motorola, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 408
- 終了ページ:
- 419
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
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1
国際会議録
Process, design, and optical proximity correction requirements for the 65-nm device generation
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2
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Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
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