Vortex via process: analysis and mask fabrication for contact CDs <80 nm
- 著者名:
Levenson, M.D. ( M.D. Levenson Consulting (USA) ) Tan, S.M. ( Univ. of Auckland (New Zealand) ) Dai, G. ( SIGMA-C (USA) ) Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) ) Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) ) Ebihara, T. ( Canon USA, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 344
- 終了ページ:
- 370
- 総ページ数:
- 27
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |