Limits of strong phase-shift patterning for device research
- 著者名:
Fritze, M. ( MIT Lincoln Lab. (USA) ) Mallen, R.D. ( MIT Lincoln Lab. (USA) ) Wheeler, B. ( MIT Lincoln Lab. (USA) ) Yost, D. ( MIT Lincoln Lab. (USA) ) Snyder, J.P. ( Spinnaker Semiconductor (USA) ) Kasprowicz, B.S. ( Photronics Inc. (USA) ) Eynon, B.G. ( Photronics Inc. (USA) ) Liu, H.-Y. ( Numerical Technologies, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 327
- 終了ページ:
- 343
- 総ページ数:
- 17
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
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