157-nm lithography for 65-nm node SRAM-gate

157-nm lithography for 65-nm node SRAM-gate

著者名:

Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kim, J.-H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc (Japan) )

Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

さらに 5 件

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part One

開始ページ:

261

終了ページ:

269

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013029
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

類似資料:

1 国際会議録 157-nm chromeless phase lithography for 45-nm SRAM gate Suganaga, T., Watanabe, K., Matsuura, S., Hagiwara, T., Furukawa, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	7 国際会議録 Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens Watanabe, K., Kurose, E., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering
2 国際会議録 157-nm lithography with extremely high numerical aperture lens for 45-nm technology node Suganaga, T., Lee, J.-W., Kurose, E., Ishimaru, T., Furukawa, T., Itani, T., Fujii, K., Cashmore, J.S., Gower, M. SPIE - The International Society of Optical Engineering	8 国際会議録 Environmental control for lithography with 157-nm exposure Kitano, J., Kiba, Y., Inazawa, K., Miyoshi, S., Watanabe, H., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering
3 国際会議録 157-nm lithography with high numerical aperture lens for 70-nm technology node Suganaga, T., Kanda, N., Kim, J.-H., Yamabe, O., Watanabe, K., Furukawa, T., Miyoshi, S., Itani, T., Cashmore, J.S., … SPIE-The International Society for Optical Engineering	9 国際会議録 Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography Irie, S., Kanda, N., Watanabe, K., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering
4 国際会議録 Pattern transfer processes for 157-nm lithography Miyoshi, S., Furukawa, T., Watanabe, H., Irie, S., Itani, T. SPIE-The International Society for Optical Engineering	10 国際会議録 Optimization of the chromium-shielding attenuated phase shift mask for 157-nm lithography Kurose, E., Watanabe, K., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
5 国際会議録 Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography Watanabe, K., Yamabe, O., Kanda, N., Kim, J., Uchida, N., Irie, S., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	11 国際会議録 157-nm chromeless phase lithography with extremely high numerical aperture Watanabe, K., Hagiwara, T., Matsuura, S., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
6 国際会議録 Control of side-lobe intensity for attenuated phase-shifting mask in 157-nm lithography Watanabe, K., Kurose, E., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	12 国際会議録 157-nm resist assessment by a full-field scanner Otoguro, A., Irie, S., Ishimaru, T., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering

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