157-nm lithography for 65-nm node SRAM-gate
- 著者名:
Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Irie, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kim, J.-H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc (Japan) ) Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 261
- 終了ページ:
- 269
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
国際会議録
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |