Full-level alternating PSM for sub-100nm DRAM gate patterning
- 著者名:
Pforr, R. ( Infineon Technologies AG (Germany) ) Ahrens, M. ( Infineon Technologies AG (Germany) ) Dettmann, W. ( Infineon Technologies AG (Germany) ) Hennig, M. ( Infineon Technologies AG (Germany) ) Koehle, R. ( Infineon Technologies AG (Germany) ) Ludwig, B. ( Infineon Technologies AG (Germany) ) Morgana, N. ( Infineon Technologies AG (Germany) ) Thiele, J. ( Infineon Technologies AG (Germany) ) - 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 232
- 終了ページ:
- 243
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
国際会議録
Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |