65-nm full-chip implementation using double dipole lithography

65-nm full-chip implementation using double dipole lithography

著者名:

Hsu, S.D. ( ASML MaskTools, Inc. (USA) )

Chen, J.F. ( ASML MaskTools, Inc. (USA) )

Cororan, N. ( ASML MaskTools, Inc. (USA) )

Knose, W.T. ( ASML MaskTools, Inc. (USA) )

Broeke, D.J.V.D. ( ASML MaskTools, Inc. (USA) )

Laidig, T.L. ( ASML MaskTools, Inc. (USA) )

Wampler, K.E. ( ASML MaskTools, Inc. (USA) )

Shi, X. ( ASML MaskTools, Inc. (USA) )

Hsu, C.M. ( ASML MaskTools, Inc. (USA) )

Eurlings, M. ( ASML (Netherlands) )

Finders, J. ( ASML (Taiwan) )

Chiou, T.-B. ( ASML (Taiwan) )

Socha, R.J. ( ASML (USA) )

Conley, W. ( Motorola, Inc. (USA) )

Hsieh, Y.W. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Tuan, S. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

Hsieh, F. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) )

さらに 12 件

掲載資料名:

Optical Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5040

発行年:

2003

巻:

Part One

開始ページ:

215

終了ページ:

231

総ページ数:

17

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448453 [0819448451]

言語:

英語

請求記号:

P63600/5040

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013029
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2003 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2003.02.25-2003.02.28

類似資料:

1 国際会議録 Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond Hsu, S.D., Corcoran, N.P., Eurlings, M., Knose, W.T., Laidig, T.L., Wampler, K.E., Roy, S., Shi, X., Hsu, C.M., Chen, … SPIE-The International Society for Optical Engineering	7 国際会議録 Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node Van Den Broeke, D.J., Laidig, T.L., Chen, J.F., Wampler, K.E., Hsu, S.D., Shi, X., Socha, R.J., Dusa, M.V., Corcoran, … SPIE - The International Society of Optical Engineering
2 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering	8 国際会議録 Experimental verification of a model-based decomposition method for double dipole lithography Eurlings, M., Hsu, S.D., Hendrickx, E., op 't Root, W., Laidig, T.L., Chiou, T.-B., Chen, A., Chen, F., Vandenberghe, … SPIE - The International Society of Optical Engineering
3 国際会議録 Double dipole lithography for 65-nm node and beyond: a technology readiness review Hsu, S.D., Eurlings, M., Hendrickx, E., Van Den Broeke, D.J., Chiou, T.-B., Chen, J.F., Laidig, T.L., Shi, X., Finders, … SPIE - The International Society of Optical Engineering	9 国際会議録 Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL) Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., Hsu, S.D., Wampler, K.E., Socha, R.J., Petersen, J.S. SPIE-The International Society for Optical Engineering
4 国際会議録 Full-chip manufacturing reliability check implementation for 90-nm and 65-nm nodes using CPL and DDL Hsu, M., Laidig, T.L., Wampler, K.E., Hsu, S.D., Shi, X., Chen, J.F., Van Den Broeke, D.J., Hsieh, F. SPIE - The International Society of Optical Engineering	10 国際会議録 Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL) Van Den Broeke, D.J., Socha, R., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., Shi, … SPIE - The International Society of Optical Engineering
5 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering	11 国際会議録 Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL) Van Den Broeke, D.J., Laidig, T.L., Wampler, K.E., Hsu, S., Shi, X., Hsu, M., Burchard, P., Chen, J.F. SPIE-The International Society for Optical Engineering
6 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N.P., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering	12 国際会議録 Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50] Hsu, M., Van Den Broeke, D., Laidig, T., Wampler, K. E., Hollerbach, U., Socha, R., Chen, J. F., Hsu, S., Shi, X. SPIE - The International Society of Optical Engineering

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