Fast topography simulation using differential method
- 著者名:
- Zinn, S.Y. ( Samsung Electronics Co., Ltd. (South Korea) )
- Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
- Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
- Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
- 掲載資料名:
- Optical Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5040
- 発行年:
- 2003
- 巻:
- Part One
- 開始ページ:
- 92
- 終了ページ:
- 100
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- 言語:
- 英語
- 請求記号:
- P63600/5040
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
国際会議録
Evaluation of process capabilities for 50 keV with rectangular-shaped beam using computer simulation
SPIE-The International Society for Optical Engineering |
8
国際会議録
Resolution improvement of chemical-amplification resist using process-induced effect correction
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
American Society of Mechanical Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
国際会議録
Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks
SPIE-The International Society for Optical Engineering |