Blank Cover Image

Fast topography simulation using differential method

著者名:
  • Zinn, S.Y. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Choi, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Sohn, J.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
掲載資料名:
Optical Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5040
発行年:
2003
巻:
Part One
開始ページ:
92
終了ページ:
100
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448453 [0819448451]
言語:
英語
請求記号:
P63600/5040
資料種別:
国際会議録

類似資料:

1 国際会議録 Comparison of vector theories for aerial image calculation

Ahn, B.-S., Zinn, S.Y., Choi, S.-W., Sohn, J.-M.

SPIE-The International Society for Optical Engineering
7 国際会議録 Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator

Kim, M.-Y., Ki, W.-T., Lee, S.-H., Choi, J.-H., Choi, S.-W., Sohn, J.-M.

SPIE - The International Society of Optical Engineering
2 国際会議録 Evaluation of process capabilities for 50 keV with rectangular-shaped beam using computer simulation

Cha,B.-C., Kim,Y.-H., Choi,S.-W., Yu,Y.-H., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
8 国際会議録 Resolution improvement of chemical-amplification resist using process-induced effect correction

Choi,J.-H., Kim,C.-Y., Lee,J.-Y., Moon,S.-W., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
3 国際会議録 Application of multistep quartz etching method to strong PSMs

Kim,H.-D., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
9 国際会議録 Photoresist thickness variation due to local and global topography

Kim,J.-Y., Bak,H.-J., Sohn,Y.-S., An,I., Bang,K.-Y.M., Oh,H.-K., Han,W.-S.

SPIE-The International Society for Optical Engineering
4 国際会議録 Contact Modeling Technique of a Flexible Piston and Cylinder Using Modal Synthesis Method

W. K. Kim, S. H. Sohn, H. J. Cho, D. S. Bae, J. H. Choi

American Society of Mechanical Engineers
10 国際会議録 Doubly exposed patterning characteristics using two alternating phase-shift masks

Lee,S.-W., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Yoon,H.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
5 国際会議録 Manufacturability evaluation of model-based OPC masks

Jang, S.-H., Zinn, S.Y., Ki, W.-T., Choi, J.-H., Jeon, C-U., Choi, S.-W., Yoon, H,-S., Sohn, J.M., Oh, Y.-H., Lee, …

SPIE-The International Society for Optical Engineering
11 国際会議録 Evaluation of the practical use of GHOST technique for various e-beam resists

Cha,B.-C., Kim,J.-M., Kim,B.-G., Choi,S.-W., Yoon,H.-S., Sohn,J.-M.

SPIE - The International Society for Optical Engineering
6 国際会議録 Correction method for radial effect caused by spin process

Kim,J.-M., Choi,S.-W., Cha,B.-C., Yoon,H.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
12 国際会議録 Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks

Lee,S.-W., Chung,D.-H., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12