Fabrication of integrated circuits with high yield using ultra-thin resist processes
- 著者名:
Peters, R.D. ( Motorola Digital DNA Labs. (USA) ) Postnikov, S.V. ( Motorola Digital DNA Labs. (USA) ) Cobb, J.L. ( Motorola Digital DNA Labs. (USA) ) Dakshina-Murthy, S. ( Advanced Micro Devices,INC. (USA) ) Stephens, T. ( Motorola Digital DNA Labs. (USA) ) Parker, C. ( Motorola Digital DNA Labs. (USA) ) Luckowski, E. ( Motorola Digital DNA Labs. (USA) ) Martinez, A.M. Jr., ( Motorola Digital DNA Labs. (USA) ) Wu, W. ( Motorola Digital DNA Labs. (USA) ) Hector, S.D. ( Motorola Digital DNA Labs. (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 1390
- 終了ページ:
- 1401
- 総ページ数:
- 12
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |