Effects of quencher ability on profile in chemically amplified resist system
- 著者名:
Kim, D. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, H.-J. ( Dongjin Semichem Co., Ltd. (South Korea) ) Cho, S.-H. ( Dongjin Semichem Co., Ltd. (South Korea) ) Lee, D.-H. ( Dongjin Semichem Co., Ltd. (South Korea) ) Im, K.-H. ( Dongjin Semichem Co., Ltd. (South Korea) ) Yoo, M.-J. ( Dongjin Semichem Co., Ltd (South Korea) ) Lee, S.-H. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, J. ( Dongjin Semichem Co., Ltd (South Korea) ) Kim, J.-S. ( Hynix Semiconductor, Inc. (South Korea) ) Kim, H.-S. ( Hynix Semiconductor, Inc. (South Korea) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 1086
- 終了ページ:
- 1097
- 総ページ数:
- 12
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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