Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry
- 著者名:
Burns, S.D. ( Univ. of Texas at Austin (USA) ) Schmid, G.M. ( Univ. of Texas at Austin (USA) ) Trinque, B.C. ( Univ. of Texas at Austin (USA) ) Willson, J. ( Univ. of Texas at Austin (USA) ) Wunderlich, J. ( Univ. of Texas at Austin (USA) ) Tsiartas, P.C. ( Univ. of Texas at Austin (USA) ) Taylor, J.C. ( Univ. of Texas at Austin (USA) ) Burns, R.L. ( Univ. of Texas at Austin (USA) ) Wilson, C.G. ( Univ. of Texas at Austin (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 1063
- 終了ページ:
- 1075
- 総ページ数:
- 13
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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