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Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography

著者名:
Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yeo, G.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
さらに 2 件
掲載資料名:
Advances in Resist Technology and Processing XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5039
発行年:
2003
巻:
2
パート:
Poster Session
開始ページ:
940
終了ページ:
947
総ページ数:
8
出版情報:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
言語:
英語
請求記号:
P63600/5039
資料種別:
国際会議録

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