What an antishrinkage coating method can surmount among stumbling block of ArF resists
- 著者名:
Kim, H.-D. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Choi, S.-J. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) Moon, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 827
- 終了ページ:
- 837
- 総ページ数:
- 11
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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