Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

著者名:

Joo, H.-S. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Seo, D.C. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Kim, C.M. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Lim, Y.T. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Cho, S.D. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Lee, J.B. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Jeon, H.P. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (South Korea) )

Jung, J.C. ( Hynix Semiconductor, Inc. (South Korea) )

Shin, K.S. ( Hynix Semiconductor, Inc. (South Korea) )

Bok, C.K. ( Hynix Semiconductor, Inc. (South Korea) )

Moon, S.-C. ( Hynix Semiconductor, Inc. (South Korea) )

さらに 7 件

掲載資料名:

Advances in Resist Technology and Processing XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5039

発行年:

2003

巻:

2

パート:

Poster Session

開始ページ:

725

終了ページ:

732

総ページ数:

8

出版情報:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

言語:

英語

請求記号:

P63600/5039

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013027
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	2003 : 20th
会議開催地:	Santa Clara, CA
会議開催年:	2003.02.24-2003.02.26
論文注記:	Poster Session ; 5039-81

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1 国際会議録 High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow Joo, H.S., Seo, D.C., Kim, C.M., Lim, Y.T., Cho, S.D., Lee, J.B., Song, J.Y., Kim, K.M., Park, J.H., Jung, J.C., Shin, … SPIE - The International Society of Optical Engineering	7 国際会議録 Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist Park,J.-H., Kim,J.-Y., Seo,D.-C., Park,S.-Y., Lee,H., Kim,S.-J., Jung,J.-C., Baik,K.-H. SPIE - The International Society for Optical Engineering
2 国際会議録 New approach for 193-nm resist using modified cycloolefin resin Park, J.H., Seo, D.C., Kim, C.-M., Lim, Y.-T., Cho, S.-D., Lee, J.B., Joo,H.-S., Jeon, H.-P., Kim, S.-J., Jung, J.-C., … SPIE-The International Society for Optical Engineering	8 国際会議録 Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone Tanaka,T., Choi,S.-J., Jung,D.-W., Lee,S., Lee,S.-H., Kang,Y., Woo,S.-G., Moon,J.-T., Kavanagh,R.J., Barclay,G.G., … SPIE-The International Society for Optical Engineering
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