Newly developed alternating-copolymer-based silicon containing resists for sub-100-nm pattern fabrication
- 著者名:
- Hatakeyama, J. ( Shin-Etsu Chemical Co., Ltd. (Japan) )
- Takeda, T. ( Shin-Etsu Chemical Co., Ltd. (Japan) )
- Kinsho, T. ( Shin-Etsu Chemical Co., Ltd. (Japan) )
- Kawai, Y. ( Shin-Etsu Chemical Co., Ltd. (Japan) )
- Ishihara, T. ( Shin-Etsu Chemical Co., Ltd. (Japan) )
- 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 2
- パート:
- Poster Session
- 開始ページ:
- 672
- 終了ページ:
- 681
- 総ページ数:
- 10
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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