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A HFIPS-based polymer approach for 157-nm single layer photoresist

著者名:
Kanna, S. ( Fuji Photo Film Co., Ltd. (Japan) )
Mizutani, K. ( Fuji Photo Film Co., Ltd. (Japan) )
Yasunami, S. ( Fuji Photo Film Co., Ltd. (Japan) )
Kawabe, Y. ( Fuji Photo Film Co., Ltd. (Japan) )
Tan, S. ( Fuji Photo Film Co., Ltd. (Japan) )
Yagihara, M. ( Fuji Photo Film Co., Ltd. (Japan) )
Kokubo, T. ( Fujifilm Arch Co., Ltd. (Japan) )
Malik, S. ( Arch Chemicals Inc. (USA) )
Dilocker, S.J. ( Arch Chemicals Inc. (USA) )
さらに 4 件
掲載資料名:
Advances in Resist Technology and Processing XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5039
発行年:
2003
巻:
1
パート:
Poster Session
開始ページ:
612
終了ページ:
621
総ページ数:
10
出版情報:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
言語:
英語
請求記号:
P63600/5039
資料種別:
国際会議録

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