Comparison of ArF bilayer resists for sub-90 nm L/S fabrication
- 著者名:
Hong, J. ( Samsung Electronics Co., Ltd. (South Korea) ) Kim, H.-W. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) ) Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 1
- パート:
- Session 6
- 開始ページ:
- 249
- 終了ページ:
- 256
- 総ページ数:
- 8
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
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