Impact of thin resist processes on post-etch LER

Impact of thin resist processes on post-etch LER

著者名:

Mahorowala, A.P. ( IBM Thomas J. Watson Research Ctr. (USA) )

Goldfarb, D.L. ( IBM Thomas J. Watson Research Ctr. (USA) )

Temple, K. ( IBM Thomas J. Watson Research Ctr. (USA) )

Petrillo, K.E. ( IBM Thomas J. Watson Research Ctr. (USA) )

Pfeiffer, D. ( IBM Thomas J. Watson Research Ctr. (USA) )

Babich, K. ( IBM Thomas J. Watson Research Ctr. (USA) )

Angelopoulos, M. ( IBM Thomas J. Watson Research Ctr. (USA) )

Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) )

Rasgon, S. ( Massachusetts Institute of Technology (USA) )

Sawin, H.H. ( Massachusetts Institute of Technology (USA) )

Allen, S.D. ( IBM Microelectronics Div. (USA) )

Lang, R.N. ( IBM Microelectronics Div. (USA) )

Lawson, M.C. ( IBM Microelectronics Div. (USA) )

Kwong, R.W. ( IBM Microelectronics Div. (USA) )

Chen, K.-J. ( IBM Microelectronics Div. (USA) )

Li, W. ( IBM Microelectronics Div. (USA) )

Varanasi, P.R. ( IBM Microelectronics Div. (USA) )

Sanchez, M.I. ( IBM Almaden Research Ctr. (USA) )

Ito, H. ( IBM Almaden Research Ctr. (USA) )

Wallraff, G.M. ( IBM Almaden Research Ctr. (USA) )

Allen, R.D. ( IBM Almaden Research Ctr. (USA) )

さらに 16 件

掲載資料名:

Advances in Resist Technology and Processing XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5039

発行年:

2003

巻:

1

パート:

Session 5

開始ページ:

213

終了ページ:

224

総ページ数:

12

出版情報:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

言語:

英語

請求記号:

P63600/5039

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013027
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	2003 : 20th
会議開催地:	Santa Clara, CA
会議開催年:	2003.02.24-2003.02.26
論文注記:	Session 5. Materials for 193-nm Resists ; 5039-23

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2 国際会議録 Hardmask technology for sub-100 nm lithographic imaging Babich, K., Mahorowala, A.P., Medeiros, D.R., Pfeiffer, D., Petrillo, K.E., Angelopoulos, M., Grill, A., Patel, V., … SPIE-The International Society for Optical Engineering	8 国際会議録 Silicon containing polymer in applications for 193-nm high-NA lithography processes [6153-20] Burns, S, Pfeiffer, D, Mahorowala, A, Petrillo, K, Clancy, A, Babich, K, Medeiros D, Allen, S, Holmes, S, Crouse, M, … SPIE - The International Society of Optical Engineering
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