Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography
- 著者名:
Hong, S. ( Clariant Japan K.K. (Japan) ) Takano, Y. ( Clariant Japan K.K. (Japan) ) Kanda, T. ( IMEC (Belgium) ) Kudo, T. ( Clariant Corp. (USA) ) Padmanaban, M. ( Clariant Corp. (USA) ) Tanaka, H. ( Clariant Japan K.K. (Japan) ) Lee, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 1
- パート:
- Session 5
- 開始ページ:
- 195
- 終了ページ:
- 206
- 総ページ数:
- 12
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Evaluation of puddle time effect and optimization of development process in 193-nm lithography
SPIE - The International Society of Optical Engineering |