Blank Cover Image

New approach for pattern collapse problem by increasing contact area at sub-100nm patterning

著者名:
Lee, S.-K. ( Hynix Semiconductor, Inc. (South Korea) )
Jung, J.C. ( Hynix Semiconductor, Inc. (South Korea) )
Lee, M.S. ( Hynix Semiconductor, Inc. (South Korea) )
Lee, S.K. ( Hynix Semiconductor, Inc. (South Korea) )
Kim, S.Y. ( Hynix Semiconductor, Inc. (South Korea) )
Hwang, Y.-S. ( Hynix Semiconductor, Inc. (South Korea) )
Bok, C.K. ( Hynix Semiconductor, Inc. (South Korea) )
Moon, S.-C. ( Hynix Semiconductor, Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor, Inc. (South Korea) )
Kim, S.-J. ( Dongjin Semichem Co. (South Korea) )
さらに 5 件
掲載資料名:
Advances in Resist Technology and Processing XX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5039
発行年:
2003
巻:
1
パート:
Session 4
開始ページ:
166
終了ページ:
174
総ページ数:
9
出版情報:
Bellingham, CA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448446 [0819448443]
言語:
英語
請求記号:
P63600/5039
資料種別:
国際会議録

類似資料:

1 国際会議録 High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow

Joo, H.S., Seo, D.C., Kim, C.M., Lim, Y.T., Cho, S.D., Lee, J.B., Song, J.Y., Kim, K.M., Park, J.H., Jung, J.C., Shin, …

SPIE - The International Society of Optical Engineering
7 国際会議録 Printing 100-nm and sub-100-nm DRAM full-chip patterns with crosspole illumination in 0.63-NA ArF lithography

Kim, S.-K., Bok, C.-K., Shin, K.-S.

SPIE-The International Society for Optical Engineering
2 国際会議録 Rinse liquid to improve pattern collapse behavior

Lee, G., Lee, S.-K., Hwang, Y.-S., Jung, J.-C., Bok, C., Moon, S.-C., Shin, K.-S.

SPIE-The International Society for Optical Engineering
8 国際会議録 High-etch-rate ArF BARC composed of polyester

Hwang, Y.S., Jung, J.C., Ban, K.D., Park, S., Bok, C.K., Moon, S.C., Shin, K.S.

SPIE - The International Society of Optical Engineering
3 国際会議録 Novel rinse process for reducing pattern collapse in 0.30-k1 ArF lithography

Lee, G., Hwang, Y.S., Ban, K.D., Bok, C.K., Moon, S.C., Shin, K.S.

SPIE - The International Society of Optical Engineering
9 国際会議録 Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist

Kim, J.-W., Son, E.-K., Lee, S.-H., Kim, D., Kim, J., Lee, G., Jung, J.C., Bok, C.K., Moon, S.C., Shin, K.S.

SPIE - The International Society of Optical Engineering
4 国際会議録 Quencher gradient resist process for low-k process

Jung, J.C., Lee, S.K., Lee, W.W., Bok, C.K., Moon, S.C., Shin, K.S.

SPIE - The International Society of Optical Engineering
10 国際会議録 Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology

Joo, H.-S., Seo, D.C., Kim, C.M., Lim, Y.T., Cho, S.D., Lee, J.B., Jeon, H.P., Park, J.H., Jung, J.C., Shin, K.S., Bok, …

SPIE-The International Society for Optical Engineering
5 国際会議録 PEB sensitivity variation of 193-nm resist according to activation energy of protection groups

Oh, S.K., Kim, J.Y., Lee, J.W., Kim, D., Kim, J., Lee, G., Jung, J.C., Bok, C.K., Shin, K.S.

SPIE - The International Society of Optical Engineering
11 国際会議録 Advanced module-based approach to effective CD prediction of sub-100nm patterns

Shin, J., Kim, I., Hwang, C., Park, D.-W., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE - The International Society of Optical Engineering
6 国際会議録 Improvement of pattern collapse in sub-100 nm nodes

Jung, M.-H., Lee, S.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
12 国際会議録 Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.

Hwang, Y.-S., Jung, J.-C., Park, K.-D., Lee, S.-K., Kim, J.-S., Kong, K.-K., Shin, K.-S., Ding, S.-J., Xiang, Z., …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12