Single layer fluropolymer resists for 157-nm lithography
- 著者名:
Crawford, M.K. ( DuPont Co. (USA) ) Farnham, W.B. ( DuPont Co, (USA) ) Feiring, A.E. ( Dupont Co. (USA) ) Feldman, J. ( DuPont Co. (USA) ) French, R.H. ( DuPont Co. (USA) ) Leffew, K.W. ( DuPont Co (USA) ) Petrov, V.A. ( DuPont Co. (USA) ) Qiu, W. ( DuPont Co. (USA) ) Schadt, F.L. ( DuPont Co. (USA) ) Tran, H.V. ( DuPont Co. (USA) ) Wheland, R.C. ( DuPont Co. (USA) ) Zumsteg, F.C. Jr., ( DuPont Co. (USA) ) - 掲載資料名:
- Advances in Resist Technology and Processing XX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5039
- 発行年:
- 2003
- 巻:
- 1
- パート:
- Session 3
- 開始ページ:
- 80
- 終了ページ:
- 92
- 総ページ数:
- 13
- 出版情報:
- Bellingham, CA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448446 [0819448443]
- 言語:
- 英語
- 請求記号:
- P63600/5039
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |