Resist requirements in the era of resolution enhancement techniques (Invited Paper)

Resist requirements in the era of resolution enhancement techniques (Invited Paper)

著者名:

Petersen, J.S. ( Petersen Advanced Lithography, Inc. (USA) )
Byers, J.D. ( KLA-Tencor Corp. (USA) )

掲載資料名:

Advances in Resist Technology and Processing XX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5039

発行年:

2003

巻:

1

パート:

Session 1

開始ページ:

15

終了ページ:

21

総ページ数:

7

出版情報:

Bellingham, CA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448446 [0819448443]

言語:

英語

請求記号:

P63600/5039

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013027
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	2003 : 20th
会議開催地:	Santa Clara, CA
会議開催年:	2003.02.24-2003.02.26
論文注記:	Session 1. Future Resist Directions ; 5039-02

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