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Overlay excursion management through sample plan optimization and cycle time reduction

著者名:
Chen, X. ( KLA-Tencor Corp. (USA) )
Hung, M.-Y. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Kuo, K. ( KLA-Tencor Corp (USA) )
Fu, S. ( KLA-Tencor Corp. (USA) )
Shanthikumar, G. ( Univ. of California/Berkeley (USA) )
Mao, Z. ( Univ. of California/Berkeley (USA) )
Deng, S. ( Univ. of California/Berkeley (USA) )
Hazari, V. ( KLA-Tencor Corp. (USA) )
Monahan, K.M. ( KLA-Tencor Corp. (USA) )
Slessor, M.D. ( KLA-Tencor Corp. (USA) )
Lev, A. ( KLA-Tencor Corp. (USA) )
さらに 6 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5038
発行年:
2003
巻:
2
開始ページ:
1186
終了ページ:
1193
総ページ数:
8
出版情報:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
言語:
英語
請求記号:
P63600/5038
資料種別:
国際会議録

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