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Application of scatterometry for CD and profile metrology in 193-nm lithography process development

著者名:
Chen, L.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ke, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yu, S.S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Gau, T.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, P. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ku, Y.-C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Engelhard, D. ( Timbre Technologies, Inc. (USA) )
Hetzer, D. ( Timbre Technologies, Inc. (USA) )
Yang, J.Y. ( Timbre Technologies, Inc. (USA) )
Barry, K.A. ( Timbre Technologies, Inc. (USA) )
Yap, L. ( Timbre Technologies, Inc. (USA) )
Yang, W. ( Timbre Technologies, Inc. (USA) )
さらに 8 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5038
発行年:
2003
巻:
1
開始ページ:
568
終了ページ:
576
総ページ数:
9
出版情報:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
言語:
英語
請求記号:
P63600/5038
資料種別:
国際会議録

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