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Electron beam metrology of 193-nm resists at ultralow voltage

著者名:
Sullivan, N.T. ( Schlumberger Semiconductor Solutions (USA) )
Dixson, R. ( International SEMATECH (USA) )
Bunday, B.D. ( International SEMATECH (USA) )
Mastovich, M.E. ( Schlumberger Semiconductor Solutions (USA) )
Knutrud, P.C. ( Schlumberger Semiconductor Solutions (USA) )
Fabre, P. ( Schlumberger Semiconductor Solutions (USA) )
Brandom, R. ( Schlumberger Semiconductor Solutions (USA) )
さらに 2 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5038
発行年:
2003
巻:
1
開始ページ:
483
終了ページ:
492
総ページ数:
10
出版情報:
Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448439 [0819448435]
言語:
英語
請求記号:
P63600/5038
資料種別:
国際会議録

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