Simulation of repairing thin-film phase defect in masks for EUV lithography
- 著者名:
- Ko, Y.-U. ( Univ. of Tennessee/Knoxville (USA) )
- Joy, D.C. ( Univ. of Tennessee/Knoxville (USA) )
- Hector, S.D. ( Motorola, Inc. (USA) )
- Lu, B. ( Motorola, Inc. (USA) )
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5038
- 発行年:
- 2003
- 巻:
- 1
- 開始ページ:
- 293
- 終了ページ:
- 302
- 総ページ数:
- 10
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- 言語:
- 英語
- 請求記号:
- P63600/5038
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |