Scatterometry-based overlay metrology
- 著者名:
Huang, H.-T. ( Therma-Wave, Inc. (USA) ) Raghavendra, G. ( Therma-Wave, Inc. (USA) ) Sezginer, A. ( Therma-Wave, Inc. (USA) ) Johnson, K. ( Therma-Wave, Inc. (USA) ) Stanke, F.E. ( Therma-Wave, Inc. (USA) ) Zimmerman, M.L. ( Therma-Wave, Inc. (USA) ) Cheung, C. ( Advanced Micro Devices, Inc. (USA) ) Miyagi, M. ( Tokyo Electron Texas (USA) ) Singh, B. ( Advanced Micro Devices, Inc. (USA) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5038
- 発行年:
- 2003
- 巻:
- 1
- 開始ページ:
- 126
- 終了ページ:
- 137
- 総ページ数:
- 12
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448439 [0819448435]
- 言語:
- 英語
- 請求記号:
- P63600/5038
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
7
国際会議録
Application of scatterometry for CD and profile metrology in 193-nm lithography process development
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |