Subfield scheduling for throughput maximization in electron-beam photomask fabrication

Subfield scheduling for throughput maximization in electron-beam photomask fabrication

著者名:

Babin, S.V. ( Soft Services (USA) )
Kahng, A.B. ( Univ. of California/San Diego (USA) )
Mandoiu, I.I. ( Univ. of California/San Diego (USA) )
Muddu, S. ( Univ. of California/San Diego (USA) )

掲載資料名:

Emerging Lithographic Technologies VII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5037

発行年:

2003

巻:

2

パート:

Poster Session

開始ページ:

934

終了ページ:

942

総ページ数:

9

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

言語:

英語

請求記号:

P63600/5037

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013023
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2003 : 7th
会議開催地:	Santa Clara, California, USA
会議開催年:	2003.02.25-2003.02.27
論文注記:	Poster Session ; 5037-114

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