Reactive polymers: a route to nanoimprint lithography at low temperatures
- 著者名:
Pfeiffer, K. ( micro resist technology GmbH (Germany) ) Reuther, F. ( micro resist technology GmbH (Germany) ) Carlberg, P. ( Lund Univ. (Sweden) ) Fink, M. ( micro resist technology GmbH (Germany) ) Gruetzner, G. ( micro resist technology GmbH (Germany) ) Montelius, L. ( Lund Univ. (Sweden) ) - 掲載資料名:
- Emerging Lithographic Technologies VII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5037
- 発行年:
- 2003
- 巻:
- 1
- パート:
- Session 6
- 開始ページ:
- 203
- 終了ページ:
- 210
- 総ページ数:
- 8
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448422 [0819448427]
- 言語:
- 英語
- 請求記号:
- P63600/5037
- 資料種別:
- 国際会議録
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6
国際会議録
Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing
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