Analysis of critical dimension uniformity for Step and Flash imprint lithography

Analysis of critical dimension uniformity for Step and Flash imprint lithography

著者名:

Mancini, D.P. ( Motorola, Inc. (USA) )

Gehoski, K.A. ( Motorola, Inc. (USA) )

Dauksher, W.J. ( Motorola, Inc. (USA) )

Nordquist, K.J. ( Motorola, Inc. (USA) )

Resnick, D.J. ( Motorola, Inc. (USA) )

Schumaker, P. ( Molecular Imprints, Inc. (USA) )

McMackin, I. ( Molecular Imprints, Inc. (USA) )

さらに 2 件

掲載資料名:

Emerging Lithographic Technologies VII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5037

発行年:

2003

巻:

1

パート:

Session 6

開始ページ:

187

終了ページ:

196

総ページ数:

10

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819448422 [0819448427]

言語:

英語

請求記号:

P63600/5037

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00013023
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	2003 : 7th
会議開催地:	Santa Clara, California, USA
会議開催年:	2003.02.25-2003.02.27
論文注記:	Session 6. Nanoimprint Lithography I ; 5037-27

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1 国際会議録 Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography Mancini, D.P., Gehoski, K.A., Dauksher, W.J., Nordquist, K.J., Resnick, D.J., Schumaker, P., McMackin, I. SPIE - The International Society of Optical Engineering	7 国際会議録 Evaluation of the Imprio 100 Step and Flash Imprint Lithography tool Gehoski, K.A., Mancini, D.P., Resnick, D.J. SPIE - The International Society of Optical Engineering
2 国際会議録 Critical dimension and image placement issues for step and flash imprint lithography templates Nordquist, K.J., Mancini, D.P., Dauksher, W.J., Ainley, E.S., Gehoski, K.A., Resnick, D.J., Masnyj, Z.S., Mangat, P.J.S. SPIE-The International Society for Optical Engineering	8 国際会議録 Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device Smith, B.J., Stacey, N.A., Donnelly, J.P., Onsongo, D.M., Bailey, T.C., Mackay, C.J., Resnick, D.J., Dauksher, W.J., … SPIE-The International Society for Optical Engineering
3 国際会議録 Sub-80-nm contact hole patterning using Step and Flash Imprint Lithography Mancini, D.P., Le, N., Gehoski, K.A., Young, S., Dauksher, W.J., Nordquist, K.J., Resnick, D.J. SPIE - The International Society of Optical Engineering	9 国際会議録 Imprint lithography: lab curiosity or the real NGL (Keynote Address) Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Bailey, T.C., Johnson, S.C., Stacey, N.A., Ekerdt, J.G., … SPIE-The International Society for Optical Engineering
4 国際会議録 High-resolution templates for step and flash imprint lithography Resnick, D.J., Dauksher, W.J., Mancini, D.P., Nordquist, K.J., Ainley, E.S., Gehoski, K.A., Baker, J.H., Bailey, T.C., … SPIE-The International Society for Optical Engineering	10 国際会議録 Inspection and repair issues for Step-and-Flash Imprint Lithography templates Nordquist, K. J., Dauksher, W. J., Mancini, D. P., Resnick, D. J., Hess, H. F., Pettibone, D. W., Adler, D., Bertsche, … SPIE - The International Society of Optical Engineering
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6 国際会議録 Advances in Step and Flash imprint lithography Johnson, S.C., Bailey, T.C., Dickey, M.D., Smith, B.J., Kim, E.K., Jamieson, A.T., Stacey, N.A., Ekerdt, J.G., Willson, … SPIE-The International Society for Optical Engineering	12 国際会議録 An electrical defectivity characterization of wafers imprinted with step and flash imprint lithography W. J. Dauksher, N. V. Le, K. A. Gehoski, E. S. Ainley, K. J. Nordquist, N. Joshi SPIE - The International Society of Optical Engineering

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