Low-temperature plasma-deposited microcrystalline silicon thin films: an emerging material for stable thin film transistors
- 著者名:
Cabarrocas, P.R. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) ) Kasouit, S. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) ) Kalache, B. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) ) Vanderhaghen, R. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) ) Bonnassieux, Y. ( CNRS-Lab. de Physique des Interfaces et des Couches Minces (France) ) Elyaakoubi, M. ( UNAXIS France SA (France) ) French, I.D. ( Philips Research Labs. (United Kingdom) ) - 掲載資料名:
- Poly-Silicon Thin Film Transistor Technology and Applications in Displays and Other Novel Technology Areas
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5004
- 発行年:
- 2003
- 開始ページ:
- 84
- 終了ページ:
- 94
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448040 [0819448044]
- 言語:
- 英語
- 請求記号:
- P63600/5004
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Electrochemical Society |
Materials Research Society |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
9
国際会議録
Plasma Deposition of Silicon Clusters: A Way to Produce Silicon Thin Films With Medium-Range Order?
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |
MRS - Materials Research Society | |
Materials Research Society |
Electrochemical Society |