Chemical dry cleaning and pretreatment on the electrical and reliability characteristic of high-k gate dielectrics in MOS device (Invited Paper)

Chemical dry cleaning and pretreatment on the electrical and reliability characteristic of high-k gate dielectrics in MOS device (Invited Paper)

著者名:

Cheng, C.-L. ( National Tsing Hua Univ. (Taiwan) )
Wang, T.-K. ( National Tsing Hua Univ. (Taiwan) )
Chang-Liao, K.-S. ( National Tsing Hua Univ. (Taiwan) )

掲載資料名:

Quantum Sensing: Evolution and Revolution from Past to Future

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4999

発行年:

2003

開始ページ:

299

終了ページ:

306

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819447999 [0819447994]

言語:

英語

請求記号:

P63600/4999

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012982
シリーズID:	PA00000029
会議名:	Photonics West - Optoelectronic Materials and Devices : Quantum sensing
回次:	2003
会議開催地:	San Jose, CA, USA
会議開催年:	2003.01.27-2003.01.30

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