Zone-plate-array lithography (ZPL): a maskless fast-turn-around system for microoptic device fabrication (Invited Paper)

Zone-plate-array lithography (ZPL): a maskless fast-turn-around system for microoptic device fabrication (Invited Paper)

著者名:

Menon, R. ( Massachusetts Institute of Technology (USA) )
Gil, D. ( Massachusetts Institute of Technology (USA) )
Carter, D.J.D. ( Charles Stark Draper Labs., Inc. (USA) )
Patel, A. ( Massachusetts Institute of Technology (USA) )
Smith, H.I. ( Massachusetts Institute of Technology (USA) )

掲載資料名:

Micromachining Technology for Micro-Optics and Nano-Optics

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4984

発行年:

2003

開始ページ:

10

終了ページ:

17

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819447845 [0819447846]

言語:

英語

請求記号:

P63600/4984

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012967
シリーズID:	PA00000029
会議名:	Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components : Micromachining technology for micro-optics and nano-optics
回次:	2003
会議開催地:	San Jose, CA, USA
会議開催年:	2003.01.28-2003.01.29

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