High-power optical microswitch fabricated by deep reactive ion etching (DRIE)

High-power optical microswitch fabricated by deep reactive ion etching (DRIE)

著者名:

Cochran, K.R. ( Univ. of Maryland/College Park (USA) )
Fan, L. ( Naval Surface Warfare Ctr. (USA) )
DeVoe, D.L. ( Univ. of Maryland/College Park (USA) )

掲載資料名:

MOEMS and Miniaturized Systems III

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4983

発行年:

2003

開始ページ:

75

終了ページ:

86

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819447838 [0819447838]

言語:

英語

請求記号:

P63600/4983

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012966
シリーズID:	PA00000029
会議名:	Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components : MOEMS and miniaturized systems
回次:	2003 : 3rd
会議開催地:	San Jose, CA, USA
会議開催年:	2003.01.27-2003.01.29

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