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Modification of sidewall roughness in silica deep etching and its influence on coupling loss in hybrid integration

著者名:
  • Choi, D.Y. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Lee, J.H. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Kim, D.S. ( Samsung Electronics Co., Ltd. (South Korea) )
  • Jung, S.T. ( Samsung Electronics Co., Ltd. (South Korea) )
掲載資料名:
Integrated Optical Devices: Fabrication and Testing
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4944
発行年:
2003
開始ページ:
337
終了ページ:
345
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819447395 [0819447390]
言語:
英語
請求記号:
P63600/4944
資料種別:
国際会議録

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