Fabrication of microstructure using electrochemical etching in hydrofluoric acid
- 著者名:
- Huang, J.-Y. ( Industrial Technology Research Institute (Taiwan) )
- Tsai, H.-Y. ( Industrial Technology Research Institute (Taiwan) )
- Wu, C.-H. ( Industrial Technology Research Institute (Taiwan) )
- Su, C.-C. ( Industrial Technology Research Institute (Taiwan) )
- Fan, C.-H. ( Industrial Technology Research Institute (Taiwan) )
- 掲載資料名:
- Nano- and Microtechnology: Materials, Processes, Packaging, and Systems
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4936
- 発行年:
- 2002
- 開始ページ:
- 302
- 終了ページ:
- 306
- 総ページ数:
- 5
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819447319 [0819447315]
- 言語:
- 英語
- 請求記号:
- P63600/4936
- 資料種別:
- 国際会議録
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11
国際会議録
Characterization of Silicon Carbide Electrochemical Etch in Hydrofluoric Acid Aqueous Solution
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