Blank Cover Image

Plasma Grown Gate Oxides on Tensile- Strained Si1-yCy/ Si Heterostructure

著者名:
掲載資料名:
Proceedings of the Eleventh International Workshop on the Physics of Semiconductor Devices : (December 11-15, 2001)
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4746
発行年:
2002
巻:
VOL-2
開始ページ:
1118
終了ページ:
1120
総ページ数:
3
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445001 [0819445002]
言語:
英語
請求記号:
P63600/4746
資料種別:
国際会議録

類似資料:

1 国際会議録 Schottky diode on Si/Si1-x-yGexCy/Si quantum well heterostructures for long wavelength IR detector

Kar,G.S., Maikap,S., Dhar,A., Ray,S.K.

SPIE-The International Society for Optical Engineering
7 国際会議録 Low Temperature Oxidation of Strained-Si in Microwave Plasma

Bera,L.K., Ray,S.K., Banerjee,H.D., Maiti,C.K.

Narosa Publishing House
2 国際会議録 Computation of Effective Mobility in Buried Channel Heterostructure MOSFET

Kar, G.S., Maikap, S., Ray, S.K., Chakrabarti, N.B.

SPIE-The International Society for Optical Engineering
8 国際会議録 Characteristics of Surface-Channel Strained Si1-yCy n-MOSFETs

Rim, K., Mitchell, T. O., Hoyt, J. L., Fountain, G., Gibbons, J. F.

MRS - Materials Research Society
3 国際会議録 Temperature Dependence of Hall Mobility in Strained Si1-xGex/Si1-x-yGexCy

Kar,G.S., Dhar,A., Ray,S.K.

SPIE - The International Society for Optical Engineering
9 国際会議録 Oxidation Studies on Strained SiGe Layer Using Microwave Oxygen Plasma

Mukhopadhyay,M., Ray,S.K., Maiti,C.K.

SPIE-The International Society for Optical Engineering, Narosa
4 国際会議録 NO/O2/NO Plasma Grown Oxynitride Films on Silicon

Maikap,S., Ray,S.K., Maiti,C.K.

SPIE - The International Society for Optical Engineering
10 国際会議録 Properties of ultrathin gate oxides grown in N20-based oxidation ambients by rapid thermal processing

Jia,Y.B., Pan,O.G., Wang,L.C., Lo,P., Lee,S.K., Choi,J.Y., Shih,J.

SPIE - The International Society for Optical Engineering
5 国際会議録 Novel Strained-Si Heterostructure NMOSFETs on Solid Phase Epitaxially Grown Relaxed Si1-xGex

Ray,S.K., John,S., Banerjee,S.K.

SPIE - The International Society for Optical Engineering
11 国際会議録 OXIDATION OF STRAINED SiGe LAYERS GROWN BY MBE

Patton, G. L., Iyer, S. S., Deale, S. L., Ganin, E., McIntosh, R. C.

Materials Research Society
6 国際会議録 Growth of Cobalt Silicide on Si(100)by Molecular Beam Epitaxy

Dhar,A., Kar,G.S., Ray,S.K.

SPIE - The International Society for Optical Engineering
12 国際会議録 Performance of fiber optic CDMA LANs with less-than-ideal components

Kar,S., Ramakrishnaiah,G., De,S.K.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12